Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Product Use

Pre-Filtration

Filtro 1" Profile II 3µm product photo

Filtro 1" Profile II 3µm

Product ID: AB01Y03018J
Unit of Measure
3/EA
Min Order Qty
3
FEATURED

Emflon® PFRW Filter Cartridge, AB05PFR2WH4

Product ID: AB05PFR2WH4
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
0.2 µm
Membrane Material
Double Layer PTFE
Effective Filtration Area (Metric cm²)
4000 cm²
Filter Cartridge Style
Code 2
Cartridge Length (Imperial)
5 in
Cartridge Length (Metric)
127 mm
See All Attributes

Fluorodyne® II Filter Cartridges, AB1FSD7WH4

Product ID: AB1FSD7WH4
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
0.2 µm
Membrane Material
Hydrophilic polyvinylidene fluoride (PVDF)
Effective Filtration Area (Metric m²)
0.55 m²
Filter Cartridge Style
Code 7
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
See All Attributes

Fuente II Filter Cartridge, AB1FFN7WH4

Product ID: AB1FFN7WH4
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
0.2 µm
Membrane Material
Double Layer PES, with built in pre-filtration
Effective Filtration Area (Metric m²)
1.04 m²
Filter Cartridge Style
Code 7
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
See All Attributes

O-RING SEAL FOR PDC12 HOUSING (SILICONE)

Product ID: PDC80744S
Unit of Measure
1/EA
Min Order Qty
1

O-RING FEP 18.64 I/D X 3.53

Product ID: PDC81036P
Unit of Measure
1/EA
Min Order Qty
1

KIT PDC80020S

Product ID: PDC80020S
Unit of Measure
1/EA
Min Order Qty
1

WSFZ Top Centerpost Gasket

Product ID: PDC80102P
Unit of Measure
1/EA
Min Order Qty
1

KIT PDC20142S

Product ID: PDC20142S
Unit of Measure
1/EA
Min Order Qty
1
Poly-Fine® II, Filter Cartridges, Removal Rating 0.1 μm, Polypropylene, Length 10 Inches, Nitrile product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.1 μm, Polypropylene, Length 10 Inches, Nitrile

Product ID: PFT0110UN959
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.1 µm
PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM product photo

PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM

Product ID: PFT0210UEBLK794
Unit of Measure
30/EA
Min Order Qty
30
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.1 μm, Polypropylene, Length 10 Inches, Fluorocarbon Elastomer product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.1 μm, Polypropylene, Length 10 Inches, Fluorocarbon Elastomer

Product ID: PFT0110UVM3958
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.1 µm

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

    Select Language :