Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Segments

Juice

Product Use

Sterile Filtration and Clarification

Palltronic® Red Pneumatic Tubing (2m) with Stäubli fittings, CT001-INTUBING

Product ID: CT001-INTUBING
Unit of Measure
1/EA
Min Order Qty
1
Connections
Staubli Nipple
Length (m)
2 m

Palltronic® Blue Pneumatic Tubing (3m) with Stäubli fittings and vent valve (connects Compact Touch to test housing)

Product ID: CT001-OUTTUBING
Unit of Measure
1/EA
Min Order Qty
1
Connections
Staubli Coupling
Length (m)
3 m

Palltronic® Compact Touch External Power Supply, CT001-EXTPWR

Product ID: CT001-EXTPWR
Unit of Measure
1/EA
Min Order Qty
1
Adapter Info
Includes EU, UK, US, AU adaptors

Palltronic® Compact Touch Thermal Printer Paper, CT001-PRTPAPER

Product ID: CT001-PRTPAPER
Unit of Measure
1/EA
Min Order Qty
1
Paper
Thermal
Paper Roll Diameter
45 mm
Paper Roll Length
25 m
Paper Roll Width
58 mm
4 Items
  • 1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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