Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Availability

In Stock

Nominal OD (Metric)

7.11 cm

Anti Static

No

Ultipor III Glass Fiber 7 micron (Beta 1000) Fluorocarbon 8in 20.32cm (REPLACED BY HC9104FRN8ZYP58)

Product ID: HC9104FKN8ZYP58
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC9104
Family
Ultipor III
Filter Media
Glass Fiber
Filter Removal Rating (μm)
7 µm
See All Attributes

Ultipor III Glass Fiber 5 micron (Beta 1000) Chloroprene 4in 10.16cm (REPLACED BY HC9104FRP4PYR19)

Product ID: HC9104FKP4PYR19
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC9104
Family
Ultipor III
Filter Media
Glass Fiber
Filter Removal Rating (μm)
5 µm
See All Attributes

This product is currently not available. Please contact us for more information.

Red1000 Glass Fiber 7 micron (Beta 1000) Nitrile 10in 25.4cm (REPLACED BY HC9725FRN10Z)

Product ID: HC9725FKN10H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC9725
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating (μm)
7 µm
See All Attributes

Red1000 Glass Fiber 25 micron (Beta 1000) Nitrile 6in 15.24cm length (REPLACED BY HC2218FRT6Z)

Product ID: HC2218FKT6H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2218
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating (μm)
25 µm
See All Attributes
4 Items
  • 1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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