Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Diameter

287 mm

SUPRAdisc SD II 080 200X080C232SPW

Product ID: 7007865
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
Diameter (Imperial)
12 in
Diameter (Metric)
287 mm
See All Attributes

SUPRAdisc SD II 150 200X150C232SPW

Product ID: 7007867
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
Diameter (Imperial)
12 in
Diameter (Metric)
287 mm
See All Attributes

SUPRAdisc SD II EK 200XEK0C232SPW

Product ID: 7007869
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
Diameter (Imperial)
12 in
Diameter (Metric)
287 mm
See All Attributes

SUPRAdisc SD II EK 1 200XEK1C232SPW

Product ID: 7007871
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
Diameter (Imperial)
12 in
Diameter (Metric)
287 mm
See All Attributes

SUPRAdisc SD II 250 200X250C232SPW

Product ID: 7007868
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
Diameter (Imperial)
12 in
Diameter (Metric)
287 mm
See All Attributes

SUPRAdisc SD II 200 200X200C232SPW

Product ID: 7007870
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
Diameter (Imperial)
12 in
Diameter (Metric)
287 mm
See All Attributes

SUPRAdisc SD II 100 200X100C232SPW

Product ID: 7007872
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
Diameter (Imperial)
12 in
Diameter (Metric)
287 mm
See All Attributes

SUPRAdisc SD II 300 200X300C232SPW

Product ID: 7007876
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
Diameter (Imperial)
12 in
Diameter (Metric)
287 mm
See All Attributes

SUPRAdisc SD II 700 200X700C232SPW

Product ID: 7007866
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
Diameter (Imperial)
12 in
Diameter (Metric)
287 mm
See All Attributes

SUPRAdisc SD II 900 200X900C232SPW

Product ID: 7007882
Unit of Measure
1/EA
Min Order Qty
1
1. Recommended Max. Backpressure During Backwash
0.5 bar
2. Recommended Max. Backpressure During Backwash
7.25 psid
Adaptor Type
Double Open End, Flat Gasket
Core Drainage Discs
Polypropylene
Diameter (Imperial)
12 in
Diameter (Metric)
287 mm
See All Attributes
10 Items
  • 1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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