Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Filter Media

Polypropylene

U001AW20A product photo

U001AW20A

Product ID: U001AW20A
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Bulk
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U030AW30U-EC1U product photo

U030AW30U-EC1U

Product ID: U030AW30UEC1U
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Bulk
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Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 10 Inches, Fluorocarbon Elastomer, SOE fin end external 222 O-rings product photo
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.45 µm

Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 10 Inches, Expanded PTFE gaskets FEP encapsulated silicone Orings, SOE fin end external 226 O-rings

Product ID: PFT04510UTM7
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
0.45 µm
Membrane Material
Polypropylene
Industry-Specific Certification
General Use
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
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Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 19.5 Inches, EPDM product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 19.5 Inches, EPDM

Product ID: PFT045195UE
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.45 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 20 Inches, FEP encapsulated Fluorocarbon Elastomer Orings, SOE flat closed end external 222 O-rings product photo
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.45 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 20 Inches, EPDM, SOE flat closed end external 222 O-rings product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 20 Inches, EPDM, SOE flat closed end external 222 O-rings

Product ID: PFT04520UEM3
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.45 µm
PFT 0.45-20UE-M7W 480 product photo

PFT 0.45-20UE-M7W 480

Product ID: PFT04520UEM7W480
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.45 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 10 Inches, Fluorocarbon Elastomer, SOE flat closed end external 222 O-rings product photo
Unit of Measure
30/EA
Min Order Qty
30
Micron
0.45 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 20 Inches, Nitrile, DOE industrial, 100 Bubble Test product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 20 Inches, Nitrile, DOE industrial, 100 Bubble Test

Product ID: PFT04520UNB
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.45 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 20 Inches, EPDM, DOE industrial product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 20 Inches, EPDM, DOE industrial

Product ID: PFT04520UE
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.45 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 20 Inches, Nitrile, DOE industrial, No Bubble Test product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 20 Inches, Nitrile, DOE industrial, No Bubble Test

Product ID: PFT04520UN
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.45 µm

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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