Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Filter Media

Wire Mesh

Ultipleat SRT Wire Mesh 40 micron Fluorocarbon 20in 50.8cm

Product ID: UE319KR20Z
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
Yes
Element Series
UE319
Family
Ultipleat SRT
Filter Media
Wire Mesh
Filter Removal Rating (μm)
40 µm
Nominal Length (Imperial)
20 in
See All Attributes

HCA082EOS8Z ELEMENT

Product ID: HCA082EOS8Z
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCA082
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
8 in
See All Attributes

HCY-8300EOM39HYK

Product ID: HCY8300EOM39HYK
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY830
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
50 µm
Nominal Length (Imperial)
39 in
See All Attributes

HCY-8300EOJ16H

Product ID: HCY8300EOJ16H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY830
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
22 µm
Nominal Length (Imperial)
16 in
See All Attributes

HCY-8300EOR39HYK

Product ID: HCY8300EOR39HYK
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY830
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
65 µm
Nominal Length (Imperial)
39 in
See All Attributes

HCY-8300EOJ39HYK

Product ID: HCY8300EOJ39HYK
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY830
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
22 µm
Nominal Length (Imperial)
39 in
See All Attributes

This product is currently not available. Please contact us for more information.

HCY-8300EOS20HYK

Product ID: HCY8300EOS20HYK
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY830
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
20 in
See All Attributes

HCY-8900EOM26H

Product ID: HCY8900EOM26H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY890
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
50 µm
Nominal Length (Imperial)
26 in
See All Attributes

Red1000 Wire Mesh 22 micron Nitrile 4in 10.16cm

Product ID: HCY9020EOJ4H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY902
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
22 µm
Nominal Length (Imperial)
4 in
See All Attributes

HCY-8300EOS26HYK

Product ID: HCY8300EOS26HYK
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY830
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
26 in
See All Attributes

Ultipor III Wire Mesh 50 micron Nitrile 16in 40.64cm length

Product ID: HC8300EOM16H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC8300
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
50 µm
Nominal Length (Imperial)
16 in
See All Attributes

Ultipor III Wire Mesh 50 micron Nitrile 26in 66.04cm

Product ID: HC8300EOM26H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC8300
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
50 µm
Nominal Length (Imperial)
26 in
See All Attributes

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

    Select Language :