Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Gasket / O-Ring Material

NA

C003AW40A-1PK product photo

C003AW40A-1PK

Product ID: C003AW40A1PK
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Individually wrapped
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Nexis® A Series Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 9.75 inches

Product ID: NXA3975U
Unit of Measure
30/EA
Min Order Qty
30
Removal Rating
3 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
9.75 in
Cartridge Length (Metric)
248 mm
Cartridge Length (Metric)
24.8 cm
Gasket / O-Ring Material
NA
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Nexis® T Filter Cartridges, Removal Rating 100 μm, Polypropylene, Length 29.25 inches

Product ID: NXT1002925U
Unit of Measure
10/EA
Min Order Qty
10
Removal Rating
100 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
29.25 in
Cartridge Length (Metric)
743 mm
Cartridge Length (Metric)
74.3 cm
Gasket / O-Ring Material
NA
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Nexis® T Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 9.75 inches, DOE industrial (no end caps)

Product ID: NXT10975U729
Unit of Measure
30/EA
Min Order Qty
30
Removal Rating
10 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
9.75 in
Cartridge Length (Metric)
248 mm
Cartridge Length (Metric)
24.8 cm
Gasket / O-Ring Material
NA
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Nexis® T Filter Cartridges, Removal Rating 15 μm, Polypropylene, Length 29.25 inches

Product ID: NXT152925U
Unit of Measure
20/EA
Min Order Qty
20
Removal Rating
15 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
29.25 in
Cartridge Length (Metric)
743 mm
Cartridge Length (Metric)
74.3 cm
Gasket / O-Ring Material
NA
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G F005AW30A-1PK product photo

G F005AW30A-1PK

Product ID: GF005AW30A1PK
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Individually wrapped
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G G001AW20A-1PK product photo

G G001AW20A-1PK

Product ID: GG001AW20A1PK
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Individually wrapped
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G G005AW20A-1PK product photo

GG005AW20A1PK

Product ID: GG005AW20A1PK
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Individually wrapped
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E010AW30S-EC1S product photo

E010AW30S-EC1S

Product ID: E010AW30SEC1S
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Bulk
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E025AW30S-EC1S product photo

E025AW30S-EC1S

Product ID: E025AW30SEC1S
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Bulk
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E050AW30S-EC1S product photo

E050AW30S-EC1S

Product ID: E050AW30SEC1S
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Bulk
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E100AW30S product photo

E100AW30S

Product ID: E100AW30S
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Bulk
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Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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