Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Nominal Length (Imperial)

16 in

Filter Removal Rating

40 µm

Supralon™ Lube and Hydraulic Elements, Removal Rating 40 μm, GlassFiber, Length 16 Inches

Product ID: HC8304FRR16Z
Unit of Measure
6/EA
Min Order Qty
6
Anti-Static
Yes
Element Series
HC8304
Family
Supralon
Filter Media
Glass Fiber
Filter Removal Rating
40 micron
Filter Removal Rating (μm)
40 µm
See All Attributes

Supralon™ Lube and Hydraulic Elements, Removal Rating 40 μm, GlassFiber, Length 16 Inches

Product ID: HC8314FRR16Z
Unit of Measure
6/EA
Min Order Qty
6
Anti-Static
Yes
Element Series
HC8314
Family
Supralon
Filter Media
Glass Fiber
Filter Removal Rating
40 micron
Filter Removal Rating (μm)
40 µm
See All Attributes

Supralon™ Lube and Hydraulic Elements, Removal Rating 40 μm, GlassFiber, Length 16 Inches

Product ID: HC8900FRR16Z
Unit of Measure
3/EA
Min Order Qty
3
Anti-Static
Yes
Element Series
HC8900
Family
Supralon
Filter Media
Glass Fiber
Filter Removal Rating
40 micron
Filter Removal Rating (μm)
40 µm
See All Attributes

Supralon™ Lube and Hydraulic Elements, Removal Rating 40 μm, GlassFiber, Length 16 inches

Product ID: HC9600FRR16Z
Unit of Measure
12/EA
Min Order Qty
12
Anti-Static
Yes
Element Series
HC9600
Family
Supralon
Filter Media
Glass Fiber
Filter Removal Rating
40 micron
Filter Removal Rating (μm)
40 µm
See All Attributes

Ultipor III 40 micron Nitrile 16in 40.64cm (REPLACED BY HC9600FRR16Z)

Product ID: HC9600FKR16H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC9600
Family
Ultipor III
Filter Removal Rating (μm)
40 µm
Nominal Length (Imperial)
16 in
Nominal Length (Metric)
40.64 cm
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Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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