Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Supralon™ Lube and Hydraulic Fluid Filter Elements, Removal Rating 7 μm, GlassFiber, Length 13 inches

Product ID: HC9604FRN13H
Unit of Measure
6/EA
Min Order Qty
6
Removal Rating
7 µm
Membrane Material
Glass Fiber

EWHF16G89ZZJ

Product ID: EWHF16G89ZZJ
Unit of Measure
1/EA
Min Order Qty
1
DFT Classic®, Filter Cartridges, Removal Rating 20 μm, GlassFiber, Length 20 Inches product photo

DFT Classic®, Filter Cartridges, Removal Rating 20 μm, GlassFiber, Length 20 Inches

Product ID: F020AW20S1PK
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Individually wrapped
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DFT Classic®, Filter Cartridges, Removal Rating 10 μm, GlassFiber, Length 20 Inches product photo

DFT Classic®, Filter Cartridges, Removal Rating 10 μm, GlassFiber, Length 20 Inches

Product ID: F010AW20A1PK
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Individually wrapped
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O-RING VITN ORH-014 FTM

Product ID: F1126551
Unit of Measure
1/EA
Min Order Qty
1

O-RING BUNA OR-111

Product ID: F1124344
Unit of Measure
1/EA
Min Order Qty
1

O-RING VITN ORH-908 FTM

Product ID: F1124508
Unit of Measure
1/EA
Min Order Qty
1

O-RING VITN ORH-133

Product ID: F1124513
Unit of Measure
1/EA
Min Order Qty
1

O-RING BUNA OR-262 FTM

Product ID: F1124504
Unit of Measure
1/EA
Min Order Qty
1

RING RTNG UR-218

Product ID: F1124502
Unit of Measure
1/EA
Min Order Qty
1

O-RING BUNA OR-133

Product ID: F1124514
Unit of Measure
1/EA
Min Order Qty
1

O-RING BUNA OR-904 FTM

Product ID: F1124510
Unit of Measure
1/EA
Min Order Qty
1
1,628 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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