Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Availability

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Supralon™ Lube and Hydraulic Elements, Removal Rating 7 μm, GlassFiber, Length 12 Inches

Product ID: HC2286FRN12Z50
Unit of Measure
3/EA
Min Order Qty
3
Anti-Static
Yes
Beta Rating
BETA 2000
Element Series
HC2286
Family
Supralon
Filter Media
Glass Fiber
Filter Removal Rating
7 micron (Beta 2000)
See All Attributes
FEATURED

Supralon™ Lube and Hydraulic Elements, Removal Rating 7 μm, GlassFiber, Length 13 inches

Product ID: HC9604FRN13H
Unit of Measure
6/EA
Min Order Qty
6
Removal Rating
7 µm
Membrane Material
Glass Fiber

O-RING FLCB ORH904

Product ID: 1124511
Unit of Measure
1/EA
Min Order Qty
1

O-RING ORH262

Product ID: 1126564
Unit of Measure
1/EA
Min Order Qty
1

Supralon™ Lube and Hydraulic Elements, Removal Rating 5 μm, GlassFiber, Length 13 Inches

Product ID: 0107993-KP
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 2000
Element Series
HC9600
Family
Supralon
Filter Media
Glass Fiber
Filter Removal Rating
5 micron (Beta 2000)
See All Attributes

PLUG BLD SAE HX HD-4

Product ID: 1128258
Unit of Measure
1/EA
Min Order Qty
1

O-RING NITL OR119

Product ID: 1112310
Unit of Measure
1/EA
Min Order Qty
1

O-RING NITL OR136

Product ID: 1128339
Unit of Measure
1/EA
Min Order Qty
1

O-RING FLCB ORH139

Product ID: 1127314
Unit of Measure
1/EA
Min Order Qty
1

O-RING FLCB ORH245 K

Product ID: 1129258
Unit of Measure
1/EA
Min Order Qty
1

UE210AN08Z ELEMENT BRANDED KMT

Product ID: 1000671
Unit of Measure
1/EA
Min Order Qty
1
Family
-

O-RING FLCB ORH906

Product ID: 1128053
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)

Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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