Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Supralon™ Lube and Hydraulic Fluid Filter Elements, Removal Rating 7 μm, GlassFiber, Length 13 inches

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Unit of Measure
6/EA
Min Order Qty
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Removal Rating
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Membrane Material
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Poly-Fine® XLD Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 20 inches, silicone, DOE industrial

Product ID: XLD1020US
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
10 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
Silicone
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Poly-Fine® XLD Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 20 inches, Nitrile, DOE industrial

Product ID: XLD320UN
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
3 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
Nitrile
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Marksman™, Large Format Filters, Filter Grade 10 µm, Polypropylene, Size 2 bag, Nitrile

Product ID: XLDM102UNPFA
Unit of Measure
4/EA
Min Order Qty
4

Marksman™, Large Format Filters, Filter Grade 1.5 µm, Polypropylene, Size 2 bag, EPDM, Plastic self-adjusting flange

Product ID: XLDM152UEPFA
Unit of Measure
1/EA
Min Order Qty
1

Marksman™, Large Format Filters, Filter Grade 1.5 µm, Polypropylene, Size 2 bag, No flange

Product ID: XLDM152UNF
Unit of Measure
4/EA
Min Order Qty
4
1,649 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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