For CMP Applications in Microelectronics
Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.
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Why choose Profile Nano depth filter cartridges for CMP applications?
These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.
Additional benefits include:
Product Highlights:
| Materials |
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| Removal ratings |
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| Configurations |
102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in
63 mm / 2.5 in
Code 19 (222 double O-ring flat end) |
| Operating conditions |
82°C / 180°F
0.41 MPa @ 30°C / 60 psid @ 85°F 0.34 MPa @ 50°C / 50 psid @ 120°F 0.2 MPa @ 70°C / 30 psid @ 160°F 0.1 MPa @ 82°C / 15 psid @ 180°F |
