Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Outlet Connection

¼-½ in (6-13 mm) hose barb

Emflon® ll Membrane in Kleenpak™ Capsules

Emflon® II Membrane in Kleenpak™ Capsules serves the user's specific systematic needs. Pall offers options including gama-irradiatable, pre-sterilized and custom-made sets. All versions perform to the same top quality standard. Each unit is fully integrity testable and has the highly retentive Emflon II membrane. These capsule filters provide high air flows of both air and gas.

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Emflon® II membrane in Kleenpak™ capsule, 0.2 µm sterilizing grade, 820 cm² EFA, ¼-½ in. hose barb connections, pre-sterilized by gamma irradiation product photo

Emflon® II membrane in Kleenpak™ capsule, 0.2 µm sterilizing grade, 820 cm² EFA, ¼-½ in. hose barb connections, pre-sterilized by gamma irradiation

Product ID: KA2V002PV2S
Unit of Measure
1/EA
Min Order Qty
1
Membrane Material
Polyvinylidene fluoride (PVDF)
Effective Filtration Area (Metric)
820 cm²
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Emflon® II membrane in Kleenpak™ capsule, 0.2 µm sterilizing grade, 820 cm² EFA, ¼-½ in. hose barb connections, suitable for gamma irradiation product photo

Emflon® II membrane in Kleenpak™ capsule, 0.2 µm sterilizing grade, 820 cm² EFA, ¼-½ in. hose barb connections, suitable for gamma irradiation

Product ID: KA2V002PV2G
Unit of Measure
1/EA
Min Order Qty
1
Membrane Material
Polyvinylidene fluoride (PVDF)
Effective Filtration Area (Metric)
820 cm²
See All Attributes
3 Items
  • 1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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