Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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CTRG PROFILE R4F 100 ECO TEC 12684

Product ID: 12684
Unit of Measure
9/EA
Min Order Qty
9
5EC4888389003 product photo

5EC4888389003 **use 5EC4888389003JTIM

Product ID: 5EC4888389003
Unit of Measure
1/EA
Min Order Qty
1

5EC4888389400J

Product ID: 5EC4888389400J
Unit of Measure
1/EA
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1

Discontinued

This part is no longer available. Please contact us for more information.

A1449249

Product ID: A1449249
Unit of Measure
30/EA
Min Order Qty
30

A-9935 249

Product ID: A9935249
Unit of Measure
10/EA
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10

A-1555 249

Product ID: A1555249
Unit of Measure
30/EA
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30

AB04P00319J

Product ID: AB04P00319JTIMMD
Unit of Measure
1/EA
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1

AB04P40018J

Product ID: AB04P40018JTIMMD
Unit of Measure
1/EA
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1

AB1P00519J

Product ID: AB1P00519JTIMONIUM
Unit of Measure
24/EA
Min Order Qty
48

AB1P00319J

Product ID: AB1P00319JTIMONIUM
Unit of Measure
24/EA
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24

Profile® II, Filter Cartridges, Polypropylene, Length 30 Inches

Product ID: AB3Y20018H13
Unit of Measure
48/EA
Min Order Qty
48
Membrane Material
Polypropylene
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
753 mm
Cartridge Length (Metric)
75.3 cm
Cartridge Outer Diameter (OD) (Imperial)
2.75 in
Cartridge Outer Diameter (OD) (Metric)
7 cm
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AB1Y0507H4

Product ID: AB1Y0507H4
Unit of Measure
12/EA
Min Order Qty
12
1,379 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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