Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Industries

Industrial Manufacturing

Filter Removal Rating

100 µm

Filter Media

Wire Mesh

Red1000 Wire Mesh 100 micron Nitrile 15in 38.1cm

Product ID: HC2286EOS15H50
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC2286
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating
100 micron
Filter Removal Rating (μm)
100 µm
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Ultipor® I Cleanable Filter Element

Product ID: HC9600EOS13H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC9600
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
13 in
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HC2286EOS30H50, ELEMENT

Product ID: HC2286EOS30H50
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC2286
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating
100 micron
Filter Removal Rating (μm)
100 µm
See All Attributes

HCA082EOS8Z ELEMENT

Product ID: HCA082EOS8Z
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCA082
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
8 in
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Ultipor III Wire Mesh 100 micron Nitrile 8in 20.32cm

Product ID: HC9600EOS8H
Unit of Measure
12/EA
Min Order Qty
12
Anti-Static
No
Element Series
HC9600
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
8 in
See All Attributes

Ultipor® I Cleanable Filter Element

Product ID: HC9600EOS4H
Unit of Measure
12/EA
Min Order Qty
12
Anti-Static
No
Element Series
HC9600
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
4 in
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Ultipor® I Cleanable Filter Element

Product ID: HC9600EOS8Z
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC9600
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
8 in
See All Attributes

Ultipor III Wire Mesh 100 micron Nitrile 39in 99.06cm length

Product ID: HC8300EOS39H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC8300
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
39 in
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Ultipor III Wire Mesh 100 micron Nitrile 26in 66.04cm length

Product ID: HC8900EOS26H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC8900
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
26 in
See All Attributes

HCY-8300EOS20HYK

Product ID: HCY8300EOS20HYK
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY830
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
20 in
See All Attributes

HCY-8300EOS26HYK

Product ID: HCY8300EOS26HYK
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY830
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
26 in
See All Attributes

HC2296EOS36H50

Product ID: HC2296EOS36H50
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC2296
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
100 µm
Nominal Length (Imperial)
36 in
See All Attributes
14 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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