Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Family

Versalon

Nominal Length (Metric)

10.16 cm

HCG200FCS4Z ELEMENT BRANDED

Product ID: 51657348
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HCG200
Family
Versalon
Filter Media
Glass Fiber
Filter Removal Rating (μm)
12 µm
See All Attributes

ELEMENT CORALON HCT200FCT04H

Product ID: HCT200FCT04H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HCT200
Family
Versalon
Filter Media
Glass Fiber
Filter Removal Rating (μm)
25 µm
See All Attributes

Discontinued

This part is no longer available. Please contact us for more information.

ELEMENT CORALON HCT200FCS04H

Product ID: HCT200FCS04H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HCT200
Family
Versalon
Filter Media
Glass Fiber
Filter Removal Rating (μm)
12 µm
See All Attributes

Discontinued

This part is no longer available. Please contact us for more information.
3 Items
  • 1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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