Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Filter Removal Rating

22 µm

Nominal Length (Metric)

10.16 cm

Red1000 Wire Mesh 22 micron Nitrile 4in 10.16cm

Product ID: HCY9020EOJ4H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY902
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
22 µm
Nominal Length (Imperial)
4 in
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Element Coralon HC2295FCT14H

Product ID: HC2295FCT14H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2295
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating
22 micron, Beta 1000
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Discontinued

This part is no longer available. Please contact us for more information.

Red1000 Glass Fiber 22 micron (Beta 1000) Nitrile 4in 10.16cm length

Product ID: HC2208FCT4H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2208
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating
22 micron, Beta 1000
See All Attributes

Discontinued

This part is no longer available. Please contact us for more information.

Red1000 Glass Fiber 22 micron (Beta 1000) Nitrile 4in 10.16cm (REPLACED BY HC2217FHT14Z)

Product ID: HC2217FCT14H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2217
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating
22 micron, Beta 1000
See All Attributes

This product is currently not available. Please contact us for more information.

4 Items
  • 1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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