Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Applications

Particle Filtration

Product Type

Filter Cartridges

Profile® II Filter Cartridges, AB4Y0057WH4

Product ID: AB4Y0057WH4
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
0.5 µm
Membrane Material
Polypropylene
Filter Cartridge Style
Code 7
Maximum Differential Pressure
4 bard @ < 30° C (86◦ F)
Cage, Core, Fin End and Endcap
Polypropylene
Food Contact Compliant
Yes
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Claris® Filter Cartridge, CLR1010W480

Product ID: CLR1010W480
Unit of Measure
36/EA
Min Order Qty
36
Removal Rating
10 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
Gasket O-Ring Code
Blank
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Claris® Filter Cartridge, CLR120W480

Product ID: CLR120W480
Unit of Measure
24/EA
Min Order Qty
24
Removal Rating
1 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket O-Ring Code
Blank
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Claris® Filter Cartridge, CLR110W480

Product ID: CLR110W480
Unit of Measure
36/EA
Min Order Qty
36
Removal Rating
1 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
Gasket O-Ring Code
Blank
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Claris® Filter Cartridge, CLR530W480

Product ID: CLR530W480
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
5 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
Gasket O-Ring Code
Blank
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5 Items
  • 1

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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