Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Brand

HDC®

Industries

Industrial Manufacturing

MCY1001J045H2

Product ID: MCY1001J045H2
Unit of Measure
24/EA
Min Order Qty
24

This product is currently not available. Please contact us for more information.

Filter 10" HDC II 4.5µm

Product ID: MCY1001J045H13
Unit of Measure
1/EA
Min Order Qty
1

HDC II 1.2 micron MCY junior style filter

Product ID: MCY4463J012H
Unit of Measure
12/EA
Min Order Qty
12

CRTG MCY4463J400H

Product ID: MCY4463J400H
Unit of Measure
24/EA
Min Order Qty
24

FILTER CART

Product ID: AB4J0127H
Unit of Measure
1/EA
Min Order Qty
1

Junior Filter HDC II 70µm

Product ID: MCY4463J700J
Unit of Measure
12/EA
Min Order Qty
12

Filter 10" HDC II 10µm

Product ID: AB1J1003H1
Unit of Measure
6/EA
Min Order Qty
6
Junior Filter HDC II 70µm product photo

Junior Filter HDC II 70µm

Product ID: MCY4463J700H4
Unit of Measure
1/EA
Min Order Qty
1

This product is currently not available. Please contact us for more information.

Junior Filter HDC II 2.5µm

Product ID: MCY4463J025H13
Unit of Measure
12/EA
Min Order Qty
12
Filter 20" HDC II 70µm product photo

Filter 20" HDC II 70µm

Product ID: MCY1002J700H13
Unit of Measure
1/EA
Min Order Qty
1

This product is currently not available. Please contact us for more information.

CRTG DFA4201J200

Product ID: DFA4201J200
Unit of Measure
6/EA
Min Order Qty
6

Junior Filter HDC II 20µm

Product ID: MCY4463J200J
Unit of Measure
12/EA
Min Order Qty
12
135 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

    Select Language :
    English