Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Claris® Filter Cartridges, Removal Rating 50 μm, Polypropylene, Length 40 inches product photo

Claris® Filter Cartridges, Removal Rating 50 μm, Polypropylene, Length 40 inches

Product ID: CLR5040
Unit of Measure
12/EA
Min Order Qty
12
Length
102 cm / 40 in
Micron
50 micron
Claris® Filter Cartridges, Removal Rating 5 μm, Polypropylene, Length 20 inches product photo

Claris® Filter Cartridges, Removal Rating 5 μm, Polypropylene, Length 20 inches

Product ID: CLR520
Unit of Measure
24/EA
Min Order Qty
24
Length
50.8 cm / 20 in
Micron
5 micron
DFT Classic®, Filter Cartridges, Removal Rating 5 μm, Length 40 Inches, Polypropylene, Individually wrapped product photo

DFT Classic®, Filter Cartridges, Removal Rating 5 μm, Length 40 Inches, Polypropylene, Individually wrapped

Product ID: U005AW40U1PK
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Individually wrapped
See All Attributes
DFT Classic®, Filter Cartridges, Removal Rating 75 μm, Length 20 Inches, Polypropylene, Individually wrapped product photo

DFT Classic®, Filter Cartridges, Removal Rating 75 μm, Length 20 Inches, Polypropylene, Individually wrapped

Product ID: U075AW20U1PK
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Individually wrapped
See All Attributes
Claris® Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 40 inches product photo

Claris® Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 40 inches

Product ID: CLR1040
Unit of Measure
12/EA
Min Order Qty
12
Length
102 cm / 40 in
Micron
10 micron
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Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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