For CMP Applications in Microelectronics
Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.
Seal Material
Chloroprene
Nominal OD (Imperial)
1.8 in
Why choose Profile Nano depth filter cartridges for CMP applications?
These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.
Additional benefits include:
Product Highlights:
| Materials |
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| Removal ratings |
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| Configurations |
102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in
63 mm / 2.5 in
Code 19 (222 double O-ring flat end) |
| Operating conditions |
82°C / 180°F
0.41 MPa @ 30°C / 60 psid @ 85°F 0.34 MPa @ 50°C / 50 psid @ 120°F 0.2 MPa @ 70°C / 30 psid @ 160°F 0.1 MPa @ 82°C / 15 psid @ 180°F |
