Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Red1000 Glass Fiber 12 micron (Beta 1000) Nitrile 36in 91.44cm

Product ID: HC2296FKS36H
Unit of Measure
1/EA
Min Order Qty
6
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2296
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating (μm)
12 µm
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Ultipor III Glass Fiber 5 micron (Beta 1000) Nitrile 8in 20.32cm length

Product ID: HC9601FDP8H#28
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC9601
Family
Ultipor III
Filter Media
Glass Fiber
Filter Removal Rating (μm)
5 µm
See All Attributes
RT250A10S product photo

RT250A10S

Product ID: RT250A10S
Unit of Measure
30/EA
Min Order Qty
30
Packaging
Bulk
See All Attributes
PCM500WUC MONITOR CLEANLINESS product photo

PCM500WUC MONITOR CLEANLINESS

Product ID: PCM500WUC
Unit of Measure
1/EA
Min Order Qty
1

PDF .25-PFT 0.45-10U

Product ID: PDF25PFT04510U
Unit of Measure
1/EA
Min Order Qty
1
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, Nitrile, DOE industrial product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, Nitrile, DOE industrial

Product ID: PFT0220UNB
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, silicone, SOE fin end external 226 O-rings, No Bubble Test product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, silicone, SOE fin end external 226 O-rings, No Bubble Test

Product ID: PFT0220USM7
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 30 Inches, silicone, DOE industrial product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 30 Inches, silicone, DOE industrial

Product ID: PFT0230US
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.25 μm, Polypropylene, Length 30 Inches, Fluorocarbon Elastomer, SOE fin end external 226 O-rings product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.25 μm, Polypropylene, Length 30 Inches, Fluorocarbon Elastomer, SOE fin end external 226 O-rings

Product ID: PFT02530UVM7
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.25 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.25 μm, Polypropylene, Length 40 Inches, Nitrile product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.25 μm, Polypropylene, Length 40 Inches, Nitrile

Product ID: PFT02540UN
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.25 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.25 μm, Polypropylene, Length 40 Inches, silicone, SOE fin end external 222 O-rings product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.25 μm, Polypropylene, Length 40 Inches, silicone, SOE fin end external 222 O-rings

Product ID: PFT02540USM8
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.25 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 10 Inches, Expanded PTFE gaskets FEP encapsulated silicone Orings, DOE industrial product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.45 μm, Polypropylene, Length 10 Inches, Expanded PTFE gaskets FEP encapsulated silicone Orings, DOE industrial

Product ID: PFT04510UT
Unit of Measure
30/EA
Min Order Qty
30
Micron
0.45 µm
9,834 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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