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Ulti-Etch Filter

The newly developed Ulti-Etch filter is designed to improve recirculating etch bath cleanup performance.

Increased wafer diameters have caused bath volumes and pump sizes to also increase. This has created higher face velocities through recirculating etch bath filters.

Utilizing the latest advance in Pall filtration technology, the crescent shaped Ultipleat® filter design, has enabled us to improve our rapid bath clean up performance characteristics.
  • Rapid bath cleanup with particle challenge
  • Spontaneously wets in BOE (HF/NH4F mixture)
  • Very high flow rates
  • Rapid bath turnover
  • No prewetting required
  • Excellent particle removal
  • Hydrophilization modification is chemically bonded, not coated
  • Low extractables
  • Manufactured in a cleanroom environment
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설명

The newly developed Ulti-Etch filter is designed to improve recirculating etch bath cleanup performance.

Increased wafer diameters have caused bath volumes and pump sizes to also increase. This has created higher face velocities through recirculating etch bath filters.

Utilizing the latest advance in Pall filtration technology, the crescent shaped Ultipleat® filter design, has enabled us to improve our rapid bath clean up performance characteristics.
  • Rapid bath cleanup with particle challenge
  • Spontaneously wets in BOE (HF/NH4F mixture)
  • Very high flow rates
  • Rapid bath turnover
  • No prewetting required
  • Excellent particle removal
  • Hydrophilization modification is chemically bonded, not coated
  • Low extractables
  • Manufactured in a cleanroom environment

규격사양

Materials

  • Medium: Hydrophilic PVDF
  • Core, cage, and end caps: Polypropylene
  • Support and drainage: Polypropylene O-ring options: Viton1 A and Teflon1 encapsulated Viton

Removal Rating

  • 0.1 μm in recirculation mode

Configurations

  • Nominal length: 10 in. / 254 mm
  • Diameter: 2.75 in. / 70 mm
  • O-ring size / end caps: Code 3 (222 double O-ring / flat end)

Operating Conditions

  • Maximum Temperature: 165 °F / 75 °C
  • Maximum Differential Pressure: 30 psid / 2 bar
1 Viton and Teflon are trademarks of DuPont Dow Elastomers

성능

Pressure Drop vs. Liquid Flow Rate2

Pressure Drop vs. Liquid Flow Rate
2 For liquids with viscosity differing from water, multiply the pressure drop by the viscosity in centipoise.


Typical Performance Characteristics3

Typical Performance Characteristics
3 Cleanup of 200 mm Etch Bath after Particle Challenge .33 Hp Pump, 38.5 liter Recirculating Etch Bath. Counts monitored with PMS M65. PMS - Particle Measuring Systems, Boulder, CO.

종류

Filter Cartridges

주문정보

 
Part Number Nominal Length (in. / mm) O-Ring Material4
AB1UVI3EHF 10 / 254 Viton A
AB1UVI3EH1 10 / 254 Teflon Encapsulated Viton
MR1UVI3EHF 10 / 254 Viton A
MR1UVI3EH1 10 / 254 Teflon Encapsulated Viton
 
4 Other O-ring materials are available.


Unit conversion: 1 bar = 100 kilopascals

적용분야

Chemicals

영역

Semiconductor

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