설명
Pall's Gaskleen Top Mount (TM) filter assemblies are designed for ≥ 3 nanometer filtration of semiconductor process gases. The top mount filter is well-suited for integrated gas delivery systems, providing easy access and change.
- Electropolished 316L stainless steel housing
- State-of-the-art 316L stainless steel filter medium
- High temperature and pressure capabilities
- Excellent gas displacement and desorption characteristics
- 100% helium leak tested
- Manufactured and packaged in a cleanroom environment
- Available with a 1⁄4 in. VCR1 port on top of assembly for a pressure gauge or other component
- Improved corrosion resistance using Pall's proprietary process
1 VCR is a registered trademark of Swagelok Company
규격사양
Materials
- Electropolished 316L stainless steel housing
- Cr:Fe (1:1) chromium-enriched internal surface chemistry ≤ 0.7 μm Rmax internal surface finish
Removal Rating
- ≥ 3 nm
Particle Removal Characteristics
- 109 reduction at rated flow of 5 slpm
- 106 reduction at rated flow of 15 slpm
- 104 reduction at rated flow of 30 slpm
Connections
- W-seal, 11⁄2 in. interface
Leak Rating
- 100% helium leak tested to 10-9 atm•cm3/s
- Design validated to 10-11 atm•cm3/s
Operating Conditions
- Maximum operating pressure: 0.97 MPa @ 40 °C / 140 psig @ 104 °F
- Maximum allowable differential pressure: 0.69 MPa @ 40 °C / 100 psid @ 104 °F
성능
Pressure Drop vs. Gas Flow Rate
F3200
종류
Filter Capsules
추가 정보
Dimensions
GTM-3200F4A
GTMF3200F4A-VM4
주문정보
| Part Number | Description1 | Height (H) (mm / in.) | Design Flow Rate (slpm) |
| GTMF3200F4A | All 316L stainless steel | 42 / 1.65 | 0-30 |
| GTMF3200F4A-VM4 | All 316L stainless steel 1⁄4 in. VCR port | 60 / 2.36 | 0-30 |
1 Please contact Pall Microelectronics for other configurations.
적용분야
Process gas filtration
영역
Semiconductor
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