설명
The Pall HiP Kleen-Change filter is a compact capsule assembly. It is ideally suited for high pressure DI Water filtration at the point-of-use.
The innovative capsule filter is designed to provide tightly controlled water spray delivery in single wafer cleaning applications.
The hyper-fine pore membrane is designed to provide a significant improvement in particle retention with a superior flow rate.
The innovative capsule filter is designed to provide tightly controlled water spray delivery in single wafer cleaning applications.
The hyper-fine pore membrane is designed to provide a significant improvement in particle retention with a superior flow rate.
Features
- 20 nm retention using hyper-fine porous PTFE membrane construction
- Streamlined flow reduces pressure drop
- All wetted parts are metal-free and suitable for pure water contact
- Designed for high pressure operation to 10 MPa / 1,450 psig
- Provided prewet
- Compact filter size for point-of-use
- High flow rates available to 100 mL/min
규격사양
Materials of Construction |
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Removal Rating |
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Configuration |
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Filter Area |
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Maximum Operating Temperature |
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Maximum Operating Pressure (gage) |
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Maximum Forward Differential Pressure |
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Dimensions
![Dimensions Dimensions](/INTERSHOP/static/WFS/PALL-PALLUS-Site/-/PALL/en_US/images/Microelectronics/HiP_Kleen-Change_Assembly_chart2.jpg)
성능
Pressure Drop vs. Liquid Flow Rate1
![Pressure Drop vs. Liquid Flow Rate Pressure Drop vs. Liquid Flow Rate](/INTERSHOP/static/WFS/PALL-PALLUS-Site/-/PALL/en_US/images/Microelectronics/HiP_Kleen-Change_Assembly_chart1.jpg)
1 For liquids with viscosity differing from water, multiply the pressure drop by the viscosity in centipoise.
종류
Filter Capsules
주문정보
Part Number - LDSN04GPK02E11-K13
적용분야
Wet etch & cleans
영역
Semiconductor
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