Falcon® PE-Kleen™ Filter product photo Primary L

Falcon® PE-Kleen™ Filter

The Falcon PE-Kleen filter is specifically designed to filter point-of-use photochemicals. The HDPE membrane, with HDPE support and hardware allows spontaneous wettability in solvent-based photoresists. This minimizes photochemical waste by providing quick start up, minimal bubble generation, and consistent performance. Low pressure drop is ensured by the patented crescent shaped Ultipleat®filter configuration.
  • Optimized for solvent-based applicationsd
  • Low hold-up volume
  • Quick venting
  • Excellent compatibility
  • Low differential pressure
  • Low extractables
  • Manufactured in a cleanroom environment
  • Captured O-ring to ease filter change out
  • Designed to fit most older photoresist dispense systems


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Description
The Falcon PE-Kleen filter is specifically designed to filter point-of-use photochemicals. The HDPE membrane, with HDPE support and hardware allows spontaneous wettability in solvent-based photoresists. This minimizes photochemical waste by providing quick start up, minimal bubble generation, and consistent performance. Low pressure drop is ensured by the patented crescent shaped Ultipleat®filter configuration.
  • Optimized for solvent-based applicationsd
  • Low hold-up volume
  • Quick venting
  • Excellent compatibility
  • Low differential pressure
  • Low extractables
  • Manufactured in a cleanroom environment
  • Captured O-ring to ease filter change out
  • Designed to fit most older photoresist dispense systems
Specifications

Materials

  • Medium: High Density Polyethylene (HDPE)
  • Core, cage, and end caps: High Density Polyethylene (HDPE)
  • Support and drainage: High Density Polyethylene (HDPE)
  • O-ring options: Fluoroelastomer, EPR, Kalrez1, and Chemraz2

Removal Ratings

  • 1.0 μm, 0.05 μm, 30 nm, 10 nm

Filter Areas

  • 9116 style: 1900 cm2 / 2 ft2
  • 9140 and 9240 styles: 4500 cm2 / 4.8 ft2

Configurations

  • Nominal length:
    • 9116 style: 52 mm / 2.04 in.
    • 9140 style: 113.5 mm / 4.47 in.
    • 9240 style: 127.5 mm / 5.02 in.
  • Diameter: 66 mm / 2.62 in
  • O-ring size / end caps:
    • 9116 and 9140 styles: single 015 external / flat end
    • 9240 style: double 118 external / flat end

Operating Conditions

  • Maximum operating temperature: 60 °C / 140 °F
  • Maximum forward/reverse differential pressure: 340 kPa @ 50 °C / 50 psig @ 120 °F

Recommended Applications

  • 248 nm and 193 nm DUV photoresist
  • Low pH top anti-reflective coatings
1 Kalrez is a registered trademark of E. I. du Pont de Nemours and Company.
2 Chemraz is a registered trademark of Greene, Tweed & Co.
Performance

Pressure Drop vs. Liquid Flow Rate3

MCD9116
MCD9116

MCD9140 / MCD 9240
MCD9140 / MCD 9240
3 For liquids with a viscosity differing from 1cP, multiply the pressure drop by the viscosity in centipoise.
Type
Cartridges and Elements
Use
Filtration
Ordering Information
 
Part Number Removal Rating Nominal Length
(mm / in.)
O-Ring
Size / Endcap
O-Ring
Material4
MCD9116UG100EJ 1.0 μm 52 / 2.04 015 / flat end EPR
MCD9116UG100EH11 1.0 μm 52 / 2.04 015 / flat end Kalrez
MCD9140UG100EJ 1.0 μm 113.5 / 4.47 015 / flat end EPR
MCD9116UG005EJ 0.05 μm 52 / 2.04 015 / flat end EPR
MCD9140UG005EH11 0.05 μm 113.5 / 4.47 015 / flat end Kalrez
MCD9240UG005EH11 0.05 μm 127.5 / 5.02 Double 118 / flat end Kalrez
MCD9116UG003EH11 30 nm 52 / 2.04 015 / flat end Kalrez
MCD9140UG003EH11 30 nm 113.5 / 4.47 015 / flat end Kalrez
MCD9116UG001EH11 10 nm 52 / 2.04 015 / flat end Kalrez
 
4 Other O-ring materials may be available.


Unit conversion: 1 bar = 100 kilopascals
Application
Photolithography, Photolithography
Segment
LED
Semiconductor