Gaskleen® 1 1/8'' C-Seal Gas Purifier product photo Primary L

Gaskleen® 1 1/8'' C-Seal Gas Purifier

A unique combination of Pall's leading edge AresKleen purification material, combined with Ultramet-L® stainless steel filter medium, creating the industry's most advanced true point-of-use purifier.

The Gaskleen top mount purifier assembly is designed to remove homogeneous contamination from process gases to sub ppb levels, while providing 3 nm filtration.
  • Controls and reduces impurities such as O2, H2O, CO2, CO, NMHC, Ni(CO)4 and Fe(CO)5
  • Assembly hardware is made of 316 L stainless steel
  • High efficiency diffusion barrier insures integrity of reactive material until in service and upon removal
  • Superior pressure drop characteristics
  • Wide variety of gasses purified
  • 100% helium leak and pressure tested
  • Will not release hydrocarbons
  • Not orientation sensitive
  • No detectable metal contribution above background in HCl gas with HCLP material
  • No detectable metal contribution above background in HBr gas with HBRP material
Products in this datasheet may be covered by one or more patents, including US 7,465,692


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Description
A unique combination of Pall's leading edge AresKleen purification material, combined with Ultramet-L® stainless steel filter medium, creating the industry's most advanced true point-of-use purifier.

The Gaskleen top mount purifier assembly is designed to remove homogeneous contamination from process gases to sub ppb levels, while providing 3 nm filtration.
  • Controls and reduces impurities such as O2, H2O, CO2, CO, NMHC, Ni(CO)4 and Fe(CO)5
  • Assembly hardware is made of 316 L stainless steel
  • High efficiency diffusion barrier insures integrity of reactive material until in service and upon removal
  • Superior pressure drop characteristics
  • Wide variety of gasses purified
  • 100% helium leak and pressure tested
  • Will not release hydrocarbons
  • Not orientation sensitive
  • No detectable metal contribution above background in HCl gas with HCLP material
  • No detectable metal contribution above background in HBr gas with HBRP material
Products in this datasheet may be covered by one or more patents, including US 7,465,692
Specifications

Materials

  • Electropolished 316 L stainless steel components except canister
  • ≤ 0.13 μm / 5 μin Ra internal surface finish

Particle Removal Efficiency Rating

  • 1 x 109 retention of particles ≥ 3 nm up to 15 slpm

Connections

  • C-seal, 1.125 in. Interface

Operating Conditions

  • Maximum operating pressure: 3.5 MPa @ 100 °C / 500 psig @ 212 °F
  • Maximum operating temperature: 100 °C / 212 °F (INP, SIP, FCP, SF6P), 40°C / 104°F (GEH4P, OXP, CLXP, HCLP, HBRP, CDAP)
  • EU Pressure Equipment Directive: Assemblies have been evaluated and designed using SEP per the European Union's Pressure Equipment Directive 2014/68/EU and are not CE marked

Design Flow Rate

  • 0-3 slpm @ 0.21 MPa / 30 psig
  • Intermittent flow rates up to 15 slpm can be accommodated1

Packaging

  • Double bagged Outer bag: aluminized mylar2 Inner bag: polyethylene
  • Product packaged in argon environment

Dimensions

  • Height: 76.2 mm / 3.0 in.
  • Base width: 28 mm /1.125 in.
  • Shell diameter: 28 mm / 1.125 in.
1 Contact Pall Microelectronics for further information.
2 Mylar is a registered trademark of Dupont Teijin Films, US Limited.


Technical Information

Impurity Removal as Tested in Specific Gases
Specific Gas Impurity Removal Efficiency
Inert gases: Nitrogen, argon, helium, xenon, krypton, neon < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer
Flammable gases: Silane, hydrogen, methane, ethane, cyclopropane, propane, dimethyl ether < 1 ppb H2O, CO2, O2, and CO as tested in argon, nitrogen and hydrogen using APIMS analyzer

< 1 ppb H2O as tested in carbon monoxide using trace moisture analyzer

H2O and siloxanes removed to trace levels as tested in silane using APIMS
Carbon monoxide < 1 ppb Ni(CO)4, and < 1 ppb Fe(CO)5 as tested in carbon monoxide using GC-ECD analyzer
Fluoromethane, difluoromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer

< 1 ppb O2 as tested in trifluoromethane using trace oxygen analyzer

< 10 ppb H2O as tested in trifluoromethane using trace moisture analyzer and FTIR
Germane < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer
Sulfur hexafluoride < 1 ppb H2O, CO2, and O2 as tested in argon using APIMS
Oxygenated gases: Carbon dioxide, oxygen, nitrous oxide, clean dry air < 10 ppb H2O

< 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer
Chlorinated gases: Boron trichloride, chlorine, trichlorosilane, dichlorosilane < 100 ppb H2O

< 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer
Hydrogen chloride < 15 ppb H2O as tested in hydrogen chloride using CRDS

< 1 ppb H2O as tested in argon using APIMS analyzer
Hydrogen bromide < 50 ppb H2O as tested in hydrogen bromide using CRDS
< 1 ppb H2O as tested in argon using APIMS analyzer
Photolithography clean dry air < 1 ppb H2O as tested in argon using APIMS analyzer
< 300 ppt C4H8 as tested in argon using APIMS Analyzer
< 10 ppt SO2 as tested in nitrogen using ion chromatograph
< 15 ppt NH3 as tested in nitrogen using ion chromatograph
< 1 ppt HMDSO as tested in argon using APIMS analyzer and baseline subtraction

Unit conversion: 100 kilopascals = 1 bar
Performance

Pressure Drop vs. Gas Flow Rate

Pressure Drop vs. Gas Flow Rate

Lifetime Calculations

Pall AresKleen purification material: Inert gas service Gaskleen 1.125 in C-Seal Base Top Mount purifier assembly, Part # GTMP3INPCC4

Inlet pressure: 0.21 MPa (30 psig) contaminant challenge as H2O
contaminant challenge as H2O

Pall AresKleen purification material: Inert gas service Gaskleen 1.125 in C-Seal Base Top Mount purifier assembly, Part # GTMP3INPCC4

Inlet Pressure: 0.21 MPa (30 psig) contaminant challenge as O2
contaminant challenge as O2
Type
Purifiers
Use
Gas Filtration, Purification
Ordering Information
Part Number Specific Gas Effluent Purity Specifications
GTMP3INPCC4 Inert gases: Nitrogen, argon, helium, xenon, krypton, neon < 1 ppb H2O, CO2, O2, CO
GTMP3SIPCC4 Flammable gases: Silane, hydrogen, methane, ethane, cyclopropane, propane, dimethyl ether < 1 ppb H2O, CO2, O2, CO
  Carbon monoxide < 1 ppb H2O, O2, CO2, Ni(CO)4, Fe(CO)5
GTMP3FCPCC4 Fluoromethane, difluoromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane < 1 ppb H2O, CO2, O2
GTMP3GEH4PCC4 Germane < 1 ppb H2O, CO2, O2, CO
GTMP3SF6PCC4 Sulfur hexafluoride < 1 ppb H2O, CO2, O2, CO
GTMP3OXPCC4 Oxygenated gases: Carbon dioxide, oxygen, nitrous oxide < 10 ppb H2O
GTMP3CLXPCC4 Chlorinated gases: Boron trichloride, chlorine, trichlorosilane, dichlorosilane < 100 ppb H2O
GTMP3HCLPCC4 Hydrogen chloride < 15 ppb H2O
GTMP3HBRPCC4 Hydrogen bromide < 50 ppb H2O
GTMP3CDAPCC4 Photolithography clean dry air < 1 ppb H2O, < 300 ppt organics (as C4), < 10 ppt acid gases (as SO2), < 15 ppt basic gases (as NH3), < 1 ppt refractory compounds (as HMDSO)

Unit conversion: 1 bar = 100 kilopascals
Application
Process gas purification