Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Industries

Microelectronics

Availability

In Stock

R3F200

Product ID: R3F200TIMONIUM
Unit of Measure
24/EA
Min Order Qty
24

R3F700

Product ID: R3F700TIMONIUM
Unit of Measure
48/EA
Min Order Qty
48

R4F100

Product ID: R4F100TIMONIUM
Unit of Measure
12/EA
Min Order Qty
12

RM2F005H21-COA

Product ID: RM2F005H21COATIMMD
Unit of Measure
24/EA
Min Order Qty
48
U010A10U product photo

U010A10U

Product ID: U010A10U
Unit of Measure
30/EA
Min Order Qty
30
Packaging
Bulk
See All Attributes
U020AW40U-EC1U product photo

U020AW40U-EC1U

Product ID: U020AW40UEC1U
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes

DFA3001J400

Product ID: DFA3001J400
Unit of Measure
1/EA
Min Order Qty
1
DFA Capsule Nylon66 0.1µm product photo

DFA Capsule Nylon66 0.1µm

Product ID: DFA4001NIEY
Unit of Measure
1/EA
Min Order Qty
1

DFN 1-4US-M3

Product ID: DFN14USM3
Unit of Measure
1/EA
Min Order Qty
1

Filter 10" HDC II 6µm

Product ID: MCY1001J060J
Unit of Measure
24/EA
Min Order Qty
24
Claris, Polypropylene, 20 micron, 20 inch product photo

20µm, 20", DOE (no seal)

Product ID: CLR2020
Unit of Measure
24/EA
Min Order Qty
24
Length
50.8 cm / 20 in
Micron
20 micron

Y700FS10

Product ID: Y700FS10TIMONIUM
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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