Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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FLOW TRANS,IFM EFECTOR,24V,2.0",0-412CFM product photo

FLOW TRANS,IFM EFECTOR,24V,2.0",0-412CFM

Product ID: WH031989
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1/EA
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1
POSITIONER,ELEC-PNEUM DIGITAL,SMC,IP8101 product photo

POSITIONER,ELEC-PNEUM DIGITAL,SMC,IP8101

Product ID: WH034897
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1/EA
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PLC COMP,AB,COMPACTLOGIX PWR SPPLY,24VDC product photo

PLC COMP,AB,COMPACTLOGIX PWR SPPLY,24VDC

Product ID: WH049430
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1/EA
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NUT,MODULE,END CAP,2010 product photo

NUT,MODULE,END CAP,2010

Product ID: WH060417
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1/EA
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WRENCH,6.0IN MF MODULE NUT, 2010 DESIGN product photo

WRENCH,6.0IN MF MODULE NUT, 2010 DESIGN

Product ID: WH060418
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WRENCH,TORQUE,MODULE,30-150FT LB product photo

WRENCH,TORQUE,MODULE,30-150FT LB

Product ID: WH061734
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MOTOR,AMIAD,1/4 HP,208v/3ph,SAF4500 product photo

MOTOR,AMIAD,1/4 HP,208v/3ph,SAF4500

Product ID: WH078907
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1/EA
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COUPLING,FLEX,GRV,1.0IN,NONMETAL,LP product photo

COUPLING,FLEX,GRV,1.0IN,NONMETAL,LP

Product ID: WH101801
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1/EA
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1
SOLENOID,FESTO,MPA2,2X3/2,TYPE K product photo

SOLENOID,FESTO,MPA2,2X3/2,TYPE K

Product ID: WH175559
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PLC COMP,AB,1769IO,ANALOG OUTPUT,4CHAN product photo

PLC COMP,AB,1769IO,ANALOG OUTPUT,4CHAN

Product ID: WH179055
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LUBRICANT,FERGUSON PROSELECT,QUART product photo

LUBRICANT,FERGUSON PROSELECT,QUART

Product ID: WH200185
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GASKET 1314-V-BFN product photo

GASKET 1314-V-BFN

Product ID: EGR30087VI
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1/EA
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1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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