Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Industries

Microelectronics

Product Type

Filter Cartridges

K10A10U-1PK 430 product photo

K10A10U-1PK 430

Product ID: K10A10U1PK430
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Individually wrapped
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This product is currently not available. Please contact us for more information.

Filter 10" HDC II 6µm

Product ID: MCY1001J060J
Unit of Measure
24/EA
Min Order Qty
24
U001A10U product photo

U001A10U

Product ID: U001A10U
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
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R19F300

Product ID: R19F300TIMONIUM
Unit of Measure
1/EA
Min Order Qty
1
Claris, Polypropylene, 1 micron, 29.5 inch product photo

Claris, Polypropylene, 1 micron, 29.5 inch

Product ID: CLR1295
Unit of Measure
12/EA
Min Order Qty
12
Length
74.9 cm / 29.5 in
Micron
1 micron
NXA 30-30U-DOEE product photo

Nexis, NXA, 30 μm, 76.2 cm (30 in), DOE with elastomer gasket seals and end caps, EPDM gasket

Product ID: NXA3030UDOEE
Unit of Measure
1/EA
Min Order Qty
1
Micron
30 micron

R4F050

Product ID: R4F050TIMONIUM
Unit of Measure
1/EA
Min Order Qty
1

CRTG PUY1J006J

Product ID: PUY1J006J
Unit of Measure
1/EA
Min Order Qty
1

NXT 10-29.25U-H21

Product ID: NXT102925UH21
Unit of Measure
1/EA
Min Order Qty
1

NXT 75-TFU-DOEE 47

Product ID: NXT75TFUDOEE47
Unit of Measure
1/EA
Min Order Qty
1

R2F050

Product ID: R2F050TIMONIUM
Unit of Measure
24/EA
Min Order Qty
24
U075A10A product photo

U075A10A

Product ID: U075A10A
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
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Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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