Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Brand

Ultipor®

Product Type

Filter Cartridges

AB05U200Z7H4

Product ID: AB05U200Z7H4
Unit of Measure
1/EA
Min Order Qty
1

This product is currently not available. Please contact us for more information.

Filter 40" Ultipor GF+ 1µm product photo

Filter 40" Ultipor GF+ 1µm

Product ID: AB4U010Z7J
Unit of Measure
1/EA
Min Order Qty
1
5ESC10470-3U001Z-094 product photo

5ESC10470-3U001Z-094

Product ID: 5ESC104703U001Z094
Unit of Measure
1/EA
Min Order Qty
1

MCS1001U010ZH

Product ID: MCS1001U010ZH
Unit of Measure
12/EA
Min Order Qty
12

MCS1001U200ZH

Product ID: MCS1001U200ZH
Unit of Measure
12/EA
Min Order Qty
12

MCS1001U100ZH13

Product ID: MCS1001U100ZH13
Unit of Measure
12/EA
Min Order Qty
12

MCS1001U6-40ZH13

Product ID: MCS1001U640ZH13
Unit of Measure
12/EA
Min Order Qty
12

MCS1001USH13

Product ID: MCS1001USH13
Unit of Measure
6/EA
Min Order Qty
6

10" Ultipor GF+ 1µm, DOE with EPR gaskets

Product ID: MCY1001U010ZJ
Unit of Measure
24/EA
Min Order Qty
24

Filter 10" Ultipor GF+ 1µm

Product ID: MCY1001U010ZH13
Unit of Measure
1/EA
Min Order Qty
1
MCY1001ZU002ZJ product photo

MCY1001ZU002ZJ

Product ID: MCY1001ZU002ZJ
Unit of Measure
1/EA
Min Order Qty
1

5ESC10770-2U100ZJ-105

Product ID: P1122631
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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