Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Industries

Industrial Manufacturing

Featured product

false

Filter Removal Rating

12 µm

Element Series

HC2618

Family

Ultipor

Anti Static

No

Ultipor Glass Fiber 12µm Fluorocarbon Seal 36in 91.44cm length

Product ID: HC2618FKS36Z
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2618
Family
Ultipor
Filter Media
Glass Fiber
Filter Removal Rating (μm)
12 µm
See All Attributes

Ultipor Glass Fiber 12µm Fluorocarbon Seal 18in 45.72cm length

Product ID: HC2618FKS18Z
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 1000
Element Series
HC2618
Family
Ultipor
Filter Media
Glass Fiber
Filter Removal Rating (μm)
12 µm
See All Attributes
2 Items
  • 1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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