Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Industries

Microelectronics

Product Use

Pre-Filtration

CLR 30-10 product photo

30um, 10", DOE

Product ID: CLR3010
Unit of Measure
36/EA
Min Order Qty
36
Length
25.4 cm / 10 in
Micron
30 micron
Claris, Polypropylene, 50 micron, 29.25 inch product photo

Claris, Polypropylene, 50 micron, 29.25 inch

Product ID: CLR502925
Unit of Measure
12/EA
Min Order Qty
12
Length
74.3 cm / 29.25 in
Micron
50 micron
Claris, Polypropylene, 50 micron, 9.75 inch product photo

Claris, Polypropylene, 50 micron, 9.75 inch

Product ID: CLR50975
Unit of Measure
36/EA
Min Order Qty
36
Length
24.8 cm / 9.75 in
Micron
50 micron
Claris, Polypropylene, 5 micron, 29.5 inch product photo

Claris, Polypropylene, 5 micron, 29.5 inch

Product ID: CLR5295
Unit of Measure
12/EA
Min Order Qty
12
Length
74.9 cm / 29.5 in
Micron
5 micron
Claris, Polypropylene, 75 micron, 9.875 inch product photo

Claris, Polypropylene, 75 micron, 9.875 inch

Product ID: CLR759875
Unit of Measure
36/EA
Min Order Qty
36
Length
25.1 cm / 9.875 in
Micron
75 micron
Claris, Polypropylene, 75 micron, 20 inch product photo

75um, 20", DOE

Product ID: CLR7520
Unit of Measure
24/EA
Min Order Qty
24
Length
50.8 cm / 20 in
Micron
75 micron
PolyFine-II Filter Cartridge, Polyproylene, 3 µm, 30 in, Silicone Elastomer, M8 product photo

PolyFine-II Filter Cartridge, Polyproylene, 3 µm, 30 in, Silicone Elastomer, M8

Product ID: PFT330USM8
Unit of Measure
1/EA
Min Order Qty
1
Micron
3 µm
NXT 0.5-10U-M7E product photo

Nexis, NXT, 0.5 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXT0510UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron
NXT 0.5-20U product photo

Nexis, NXT, 0.5 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT0520U
Unit of Measure
1/pkg
Min Order Qty
1
Micron
0.5 micron
NXT 100-30U-M7E product photo

Nexis, NXT, 100 μm, 76.2 cm (30 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXT10030UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
100 micron
NXT 10-10U-M3F product photo

Nexis, NXT, 10 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), FEP encapsulated fluorocarbon elastomer (O-rings)

Product ID: NXT1010UM3F
Unit of Measure
1/EA
Min Order Qty
1
Micron
10 micron
NXT 10-40U-M8N product photo

Nexis, NXT, 10 μm, 102 cm (40 in), SOE fin end, external 222 O-rings (retrofits other manufacturers’ Code 5), Nitrile gasket

Product ID: NXT1040UM8N
Unit of Measure
1/EA
Min Order Qty
1
Micron
10 micron
38 Items

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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