Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Industries

Microelectronics

Availability

In Stock

K3A20U-1PK 430 product photo

K3A20U-1PK 430

Product ID: K3A20U1PK430
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Individually wrapped
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Filter 10" HDC II 6µm

Product ID: MCY1001J060J
Unit of Measure
24/EA
Min Order Qty
24
NXA 2-20U-M3E product photo

Nexis, NXA, 2 μm, 50.8 cm (20 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA220UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
2 micron
USP-143 product photo

USP-143

Product ID: P2215486
Unit of Measure
1/EA
Min Order Qty
1
PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM, M3 product photo

PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM, M3

Product ID: PFT0210UEM3513
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm

RLS1FPS200

Product ID: RLS1FPS200
Unit of Measure
1/EA
Min Order Qty
1

RM2F005H21-COA

Product ID: RM2F005H21COATIMMD
Unit of Measure
24/EA
Min Order Qty
48

RM3F050H21

Product ID: RM3F050H21TIMONIUM
Unit of Measure
48/EA
Min Order Qty
48

ORH13-342 ORING LMO SHL BUNA N

Product ID: T10520030
Unit of Measure
10/EA
Min Order Qty
10
U025A9.75U-1PK product photo

U025A9.75U-1PK

Product ID: U025A975U1PK
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Individually wrapped
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Y010GS10

Product ID: Y010GS10TIMONIUM
Unit of Measure
1/EA
Min Order Qty
1
C050A10U product photo

C050A10U

Product ID: C050A10U
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
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28 Items

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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