Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Availability

In Stock

Product Use

Pre-Filtration

Claris® Filter Cartridges, Removal Rating 30 μm, Polypropylene, Length 39 inches product photo

Claris® Filter Cartridges, Removal Rating 30 μm, Polypropylene, Length 39 inches

Product ID: CLR3039
Unit of Measure
12/EA
Min Order Qty
12
Length
102 cm / 40 in
Micron
30 micron
Claris, Polypropylene, 50 micron, 29.25 inch product photo

Claris, Polypropylene, 50 micron, 29.25 inch

Product ID: CLR502925
Unit of Measure
12/EA
Min Order Qty
12
Length
74.3 cm / 29.25 in
Micron
50 micron
Claris® Filter Cartridges, Removal Rating 50 μm, Polypropylene, Length 30 inches product photo

Claris® Filter Cartridges, Removal Rating 50 μm, Polypropylene, Length 30 inches

Product ID: CLR5030
Unit of Measure
12/EA
Min Order Qty
12
Length
76.2 cm / 30 in
Micron
50 micron
Claris® Filter Cartridges, Removal Rating 5 μm, Polypropylene, Length 19.5 inches product photo

Claris® Filter Cartridges, Removal Rating 5 μm, Polypropylene, Length 19.5 inches

Product ID: CLR5195
Unit of Measure
24/EA
Min Order Qty
24
Length
49.5 cm / 19.5 in
Micron
5 micron
Claris® Filter Cartridges, Removal Rating 5 μm, Polypropylene, Length 39 inches product photo

Claris® Filter Cartridges, Removal Rating 5 μm, Polypropylene, Length 39 inches

Product ID: CLR539
Unit of Measure
12/EA
Min Order Qty
12
Length
99.1 cm / 39 in
Micron
5 micron

Claris® Filter Cartridge, CLR530W480

Product ID: CLR530W480
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
5 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
Gasket O-Ring Code
Blank
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WSFZ Top Centerpost Gasket

Product ID: PDC80102P
Unit of Measure
1/EA
Min Order Qty
1

KIT PDC80020S

Product ID: PDC80020S
Unit of Measure
1/EA
Min Order Qty
1
PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM, M3 product photo

PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM, M3

Product ID: PFT0210UEM3513
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, EPDM product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, EPDM

Product ID: PFT0220UE
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 4 Inches, Fluorocarbon Elastomer product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 4 Inches, Fluorocarbon Elastomer

Product ID: PFT024UV
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II Filter Cartridge, PFT02510USM7W480 product photo

Poly-Fine® II Filter Cartridge, PFT02510USM7W480

Product ID: PFT02510USM7W480
Unit of Measure
12/EA
Min Order Qty
12
Micron
0.25 µm

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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