Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Family

Red1000

Nominal Length (Metric)

10.16 cm

Filter Media

Wire Mesh

Red1000 Wire Mesh 22 micron Nitrile 4in 10.16cm

Product ID: HCY9020EOJ4H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY902
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
22 µm
Nominal Length (Imperial)
4 in
See All Attributes

HC2216EOJ4H

Product ID: HC2216EOJ4H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC2216
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
25 µm
Nominal Length (Imperial)
4 in
See All Attributes
2 Items
  • 1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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