Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Industries

Biotech

Product Type

Filter Cartridges

Cartridge Length (Metric)

254 mm

NXT 40-10U-M7S product photo

Nexis, NXT, 40 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), Silicone gasket

Product ID: NXT4010UM7S
Unit of Measure
1/EA
Min Order Qty
1
Micron
40 micron
Nexis® T Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 10 inches product photo

Nexis® T Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 10 inches

Product ID: NXT110UM7S
Unit of Measure
30/EA
Min Order Qty
30
Micron
1 micron
NXA 10-10U product photo

Nexis, NXA, 10 μm, 25.4 cm (10 in), DOE industrial (no end caps)

Product ID: NXA1010U
Unit of Measure
30/EA
Min Order Qty
30
Micron
10 micron

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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