Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Brand

DFT Classic®

Cartridge Length (Imperial)

30 in

Product Type

Filter Cartridges

Gasket / O-Ring Material

NA

E100AW30S product photo

E100AW30S

Product ID: E100AW30S
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Bulk
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G F005AW30A-1PK product photo

G F005AW30A-1PK

Product ID: GF005AW30A1PK
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Individually wrapped
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G G005AW20A-1PK product photo

GG005AW20A1PK

Product ID: GG005AW20A1PK
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Individually wrapped
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3 Items
  • 1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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