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Nexis®
Profile® II Depth Filters for CMP Applications
High-Efficiency Depth Filters for CMP Application Filtration
Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.
Description
Why choose CMP depth filter cartridges?
These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.
Applications
Microelectronics:
- Chemical mechanical processing (CMP)
Specifications
Removal Ratings
- 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm
Pressure Drop vs. Liquid Flow Rate1
1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.
Documents
Data Sheets
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Profile® II Filters for CMP Applications
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