Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Brand

Water-Fine

Industries

Microelectronics

WFN 0.05-10UV-M3 314

Product ID: WFN00510UVM3314
Unit of Measure
1/EA
Min Order Qty
1

Discontinued

This part is no longer available. Please contact us for more information.

0.2 µm, 10" Double Open Ended (DOE) with EPDM Seals

Product ID: WFN0210UE300
Unit of Measure
1/EA
Min Order Qty
1

0.2 µm, 10" Single Open Ended (Code 7) with Silicone Seals

Product ID: WFN0210USM7300
Unit of Measure
1/EA
Min Order Qty
1

0.2 µm, 20" Double Open Ended (DOE) with Silicone Seals

Product ID: WFN0220US300
Unit of Measure
1/EA
Min Order Qty
1

0.2 µm, 20" Single Open Ended (Code 7) with Silicone Seals

Product ID: WFN0220USM7300
Unit of Measure
1/EA
Min Order Qty
1

WFN 0.45-10US 300

Product ID: WFN04510US300
Unit of Measure
1/EA
Min Order Qty
1

WFN 0.45-10US-M7 300

Product ID: WFN04510USM7300
Unit of Measure
1/EA
Min Order Qty
1

WFN 0.45-10US-M20 300

Product ID: WFN04510USM20300
Unit of Measure
1/EA
Min Order Qty
1

WFN 0.45-20UN 300

Product ID: WFN04520UN300
Unit of Measure
1/EA
Min Order Qty
1

WFN 0.45-30UE 300

Product ID: WFN04530UE300
Unit of Measure
1/EA
Min Order Qty
1

WFN 0.45-30US-M7 300

Product ID: WFN04530USM7300
Unit of Measure
1/EA
Min Order Qty
1

WFN 1.2-9.75UF-M10 300

Product ID: WFN12975UFM10300
Unit of Measure
1/EA
Min Order Qty
1
12 Items
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Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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