Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Industries

Microelectronics

Product Type

Other Finished Goods

G005AW30S-1PK product photo

G005AW30S-1PK

Product ID: G005AW30S1PK
Unit of Measure
1/EA
Min Order Qty
1
G075A10S-1PK product photo

G075A10S-1PK

Product ID: G075A10S1PK
Unit of Measure
1/EA
Min Order Qty
1
C030A10U product photo

C030A10U

Product ID: C030A10U
Unit of Measure
30/EA
Min Order Qty
30
MICRO-FINE 10 product photo

MICRO-FINE 10

Product ID: MICROFINE10
Unit of Measure
30/EA
Min Order Qty
30
ORH1-346 product photo

ORH1-346

Product ID: P2060104
Unit of Measure
1/EA
Min Order Qty
1
CRTG E591F2MS product photo

CRTG E591F2MS

Product ID: E591F2MS
Unit of Measure
1/EA
Min Order Qty
1
CRTG E591F2QS product photo

CRTG E591F2QS

Product ID: E591F2QS
Unit of Measure
1/EA
Min Order Qty
1
CRTG EA92F1MS product photo

CRTG EA92F1MS

Product ID: EA92F1MS
Unit of Measure
1/EA
Min Order Qty
1
AB1P053H1 product photo

AB1P053H1

Product ID: AB1P053H1
Unit of Measure
1/EA
Min Order Qty
1
CSC91HGFFK product photo

CSC91HGFFK

Product ID: CSC91HGFFK
Unit of Measure
1/EA
Min Order Qty
1
CRTG   CSP10NGRRL product photo

CRTG CSP10NGRRL

Product ID: CSP10NGRRL
Unit of Measure
1/EA
Min Order Qty
1
ELEM,PACK,P , 1.98 product photo

ELEM,PACK,P , 1.98

Product ID: D010493011005
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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