Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Cartridge Length (Imperial)

30 in

Product Type

Filter Cartridges

Gasket / O-Ring Material

NA

Filter Media

Polyester

E010AW30S-EC1S product photo

E010AW30S-EC1S

Product ID: E010AW30SEC1S
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Bulk
See All Attributes
E025AW30S-EC1S product photo

E025AW30S-EC1S

Product ID: E025AW30SEC1S
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Bulk
See All Attributes
E050AW30S-EC1S product photo

E050AW30S-EC1S

Product ID: E050AW30SEC1S
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Bulk
See All Attributes
E100AW30S product photo

E100AW30S

Product ID: E100AW30S
Unit of Measure
10/EA
Min Order Qty
10
Packaging
Bulk
See All Attributes
4 Items
  • 1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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