Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Element Series

HC2286

Family

Red1000

Anti Static

Yes

Red1000 Anti-Static Glass Fiber 12 micron (Beta 1000) Nitrile 15in 38.1cm length

Product ID: HC2286FAS15H50
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
Yes
Beta Rating
BETA 1000
Element Series
HC2286
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating (μm)
12 µm
See All Attributes

Red1000 Anti-Static Glass Fiber 7 micron (Beta 1000) Nitrile 30in 76.2cm length (REPLACED BY HC2286FRN30H50)

Product ID: HC2286FAN30H50
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
Yes
Beta Rating
BETA 1000
Element Series
HC2286
Family
Red1000
Filter Media
Glass Fiber
Filter Removal Rating (μm)
7 µm
See All Attributes

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Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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