Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Retention Rating

0.2-0.4 µm

Supracap 50 depth filter capsules are designed for developing and optimizing a process during scale-up and scale-down studies. They can be used to quickly and accurately determine which series and grade of depth filter media will provide the best performance as well as the necessary filtration area required to meet process volume

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Supracap™ 50 depth filter capsule with single-layer media grade BIO 10 (0.2-0.4 µm retention rating) and luer-lock connections product photo

Supracap™ 50 depth filter capsule with single-layer media grade BIO 10 (0.2-0.4 µm retention rating) and luer-lock connections

Product ID: SC050B010
Unit of Measure
1/EA
Min Order Qty
1
Retention Rating
0.2-0.4 µm
Membrane Material
Cellulose
Maximum Batch Volume
3 L
Effective Filtration Area (Metric)
22 cm²
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Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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