Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Gasket / O-Ring Material

EPDM

Cartridge Length (Metric)

506 mm

Profile® II Filter Cartridges, Polypropylene, Length 20 inches, EPDM

Product ID: AB2Y10018J
Unit of Measure
24/EA
Min Order Qty
48
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
506 mm
Cartridge Length (Metric)
50.6 cm
Gasket / O-Ring Material
EPDM
Cartridge Outer Diameter (OD) (Imperial)
2.75 in
See All Attributes

Profile® II Filter Cartridges, Polypropylene, Length 20 inches, EPDM

Product ID: AB2Y1007J
Unit of Measure
1/EA
Min Order Qty
1
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
506 mm
Cartridge Length (Metric)
50.6 cm
Gasket / O-Ring Material
EPDM
Cartridge Outer Diameter (OD) (Imperial)
2.75 in
See All Attributes

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2 Items
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Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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