Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Filtro Tipo RF 1" Profile II 10µm

Product ID: R01F100
Unit of Measure
6/EA
Min Order Qty
6

RF-Style 1" Profile II 15µm

Product ID: R01F150
Unit of Measure
24/EA
Min Order Qty
24

RF-Style 1" Profile II 40µm

Product ID: R01F400
Unit of Measure
6/EA
Min Order Qty
6
R05F030 product photo

RF-Style 5" Profile II 3µm

Product ID: R05F030
Unit of Measure
1/EA
Min Order Qty
1

RF-Style 19" Profile II 10µm

Product ID: R19F100
Unit of Measure
24/EA
Min Order Qty
24

RF-Style 19" Profile II 40µm

Product ID: R19F400
Unit of Measure
24/EA
Min Order Qty
24

R19F300

Product ID: R19F300TIMONIUM
Unit of Measure
1/EA
Min Order Qty
1

RF-Style 19" Profile II 70µm

Product ID: R19F700
Unit of Measure
24/EA
Min Order Qty
24

R19FYM

Product ID: R19FYMTIMONIUM
Unit of Measure
1/EA
Min Order Qty
1

CRTG R19F300

Product ID: R19F300
Unit of Measure
24/EA
Min Order Qty
24

Profile® II, Filter Cartridges, Polypropylene, Length 10 Inches

Product ID: R1F010
Unit of Measure
1/EA
Min Order Qty
1
Membrane Material
Polypropylene
Filter Cartridge Style
RF-style
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
End Configuration
R type housing
See All Attributes

Profile® II, Filter Cartridges, Polypropylene, Length 10 Inches, Timonium

Product ID: R1F005TIMONIUM
Unit of Measure
1/EA
Min Order Qty
1
Membrane Material
Polypropylene
Filter Cartridge Style
RF-style
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
End Configuration
R type housing
See All Attributes
1,477 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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