Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Industries

Microelectronics

R2F700

Product ID: R2F700TIMONIUM
Unit of Measure
24/EA
Min Order Qty
48
RT001A10A product photo

RT001A10A

Product ID: RT001A10A
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
T003A10Y product photo

T003A10Y

Product ID: T003A10Y
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
T025BB10Y-M3 product photo

T025BB10Y-M3

Product ID: T025BB10YM3
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
U010A10U product photo

U010A10U

Product ID: U010A10U
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
U030A10U product photo

U030A10U

Product ID: U030A10U
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
U050A10U product photo

U050A10U

Product ID: U050A10U
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes
U200A9.75U product photo

U200A9.75U

Product ID: U200A975U
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes

AB1UVI3EHF

Product ID: AB1UVI3EHF
Unit of Measure
1/EA
Min Order Qty
1

MPF2230F002EH1

Product ID: MPF2230F002EH1
Unit of Measure
1/EA
Min Order Qty
1
PUY1UY100J product photo

PUY1UY100J

Product ID: PUY1UY100J
Unit of Measure
1/EA
Min Order Qty
1

R3F200

Product ID: R3F200TIMONIUM
Unit of Measure
24/EA
Min Order Qty
24

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

    Select Language :