Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Supralon™ Lube and Hydraulic Elements, Removal Rating 5 μm, GlassFiber, Length 13 Inches

Product ID: 0107993-KP
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 2000
Element Series
HC9600
Family
Supralon
Filter Media
Glass Fiber
Filter Removal Rating
5 micron (Beta 2000)
See All Attributes

100P10U-1PK 359

Product ID: 100P10U1PK359
Unit of Measure
30/EA
Min Order Qty
30

100P20U

Product ID: 100P20U
Unit of Measure
20/EA
Min Order Qty
20

100P30U

Product ID: 100P30U
Unit of Measure
20/EA
Min Order Qty
20

100P20U-1PK 359

Product ID: 100P20U1PK359
Unit of Measure
10/EA
Min Order Qty
10

100U30U

Product ID: 100U30U
Unit of Measure
20/EA
Min Order Qty
20

Supralon™ Lube and Hydraulic Elements, Removal Rating 12 μm, GlassFiber, Length 8 inches

Product ID: 10696657-001
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 2000
Element Series
HC7500
Family
Supralon
Filter Media
Glass Fiber
Filter Removal Rating
12 micron (Beta 2000)
See All Attributes

Supralon™ Lube and Hydraulic Elements, Removal Rating 5 μm, GlassFiber, Length 8 inches

Product ID: 10696665-001
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Beta Rating
BETA 2000
Element Series
HC7500
Family
Supralon
Filter Media
Glass Fiber
Filter Removal Rating
5 micron (Beta 2000)
See All Attributes

10C20A

Product ID: 10C20A
Unit of Measure
1/EA
Min Order Qty
1

10C30S-1PK 346

Product ID: 10C30S1PK346
Unit of Measure
20/EA
Min Order Qty
20

10C30S

Product ID: 10C30S
Unit of Measure
20/EA
Min Order Qty
20

10C40S-1PK 346

Product ID: 10C40S1PK346
Unit of Measure
20/EA
Min Order Qty
20
4,629 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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